EE graduate student Ava Tan (advisor: Sayeef Salahuddin) has won Best in Session (Processing) for her paper "Characterization of the Interface States of Ferroelectric Hafnium Zirconium Oxide" at TECHCON 2017. Judging criteria is based on the novelty/quality of research work, relevance of the work to the semiconductor industry, and the quality of the oral (PowerPoint-based) presentation. Tan submitted an associated paper and also presented at the poster session during the conference.  Her current research interests include the development of ferroelectric, CMOS-compatible dielectrics and their subsequent integration into high-performance transistors and memory devices.   Other authors of the paper include:  Justin C. Wong, Ajay K. Yadav, Korok Chatterjee, Daewoong Kwon, Sangwan Kim, Golnaz Karbasian, and Sayeef Salahuddin.